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Title: Characterization of ceramic films and interfaces by electron microscopic and spectroscopic techniques

Conference ·
OSTI ID:6911026

In this study, Auger electron spectroscopy (AES) in combination with inert gas ion milling and cross-sectional transmission electron microscopy (XTEM) were employed to investigate the chemical and microstructural characteristics of a TiN film on a M50 steel and the film-substrate interfaces formed during ion plating at 100 C and 500 C deposition temperatures. The results of both analytical techniques indicated that the coating produced at 100 C was composed of a thin Ti layer (approximately 1000 A) and a thick TiN layer. Upon vacuum annealing at 500 C for 45 minutes, it was found that the Ti rich interlayer was transformed into a TiC phase. The coating produced at 500 C consisted of a thin TiC and a relatively thick TiN layers. Ion plating as well as post vacuum annealing at 500 C resulted in grain growth and reduced defect density. 11 refs., 8 figs.

Research Organization:
Argonne National Lab., IL (USA)
DOE Contract Number:
W-31109-ENG-38
OSTI ID:
6911026
Report Number(s):
CONF-8805152-1; ON: DE88011957
Resource Relation:
Conference: Electron microscopy of surfaces and interfaces, Oak Brook, IL, USA, 16 May 1988; Other Information: Paper copy only, copy does not permit microfiche production
Country of Publication:
United States
Language:
English