Valence photoelectron spectroscopy of Gd silicides
Journal Article
·
· Physical Review, B: Condensed Matter; (USA)
- Istituto di Fisica, Politecnico di Milano, P.za Leonardo da Vinci 32, 20133 Milano, Italy (IT)
- Stanford Electronics Laboratories, Stanford University, Stanford, California 94305 (USA)
- Istituto di Chimica Fisica, Universita di Genova, Corso Europa, Palazzo delle Scienze, 16132 Genova, (Italy)
Gd{sub 3}Si{sub 5}, GdSi, and Gd{sub 5}Si{sub 3} were investigated with photoemission spectroscopy in the photon-energy range 40.8--149 eV by exploiting the energy dependence of the photoemission cross sections and the valence resonance at the crossing of the Gd 4{ital d}-4{ital f} threshold. The modification of the spectra versus photon energy, along with their stoichiometry dependence, show the relevance of covalent mixed Gd 5{ital d}--Si 3{ital sp} states in the formation of the chemical bond. In the region close to the Fermi level an increase of the {ital d} contribution is observed. These points are discussed in connection with the existing models of the silicide bond.
- OSTI ID:
- 6910190
- Journal Information:
- Physical Review, B: Condensed Matter; (USA), Vol. 41:5; ISSN 0163-1829
- Country of Publication:
- United States
- Language:
- English
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