Thermal stability of thin-film amorphous W-Ru, W-Re, and Ta-Ir alloys

Journal Article · Sun Feb 01 00:00:00 EST 1987 · J. Appl. Phys.; (United States)

DOI:https://doi.org/10.1063/1.338171· OSTI ID:6776834

Barbour, J C; de Reus, R; Saris, F W

The crystallization behavior of self-supporting thin-film amorphous W-Ru, W-Re, and Ta-Ir alloys has been studied with transmission electron microscopy. Crystallization temperatures have been observed which are much lower than the temperatures predicted by a semiempirical model: the highest observed temperatures are 775 /sup 0/C for W-Ru and W-Re alloys, and 900 /sup 0/C for the Ta-Ir alloys. All three systems show maximum thermal stability at a composition expected using enthalpy considerations.

• Research Organization: F.O.M. Institute for Atomic and Molecular Physics, Kruislaan 407, 1098 SJ Amsterdam, The Netherlands
• OSTI ID: 6776834
• Journal Information: J. Appl. Phys.; (United States), Vol. 61:3
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
IRIDIUM
CRYSTALLIZATION
STABILITY
RHENIUM
RUTHENIUM
TANTALUM
TUNGSTEN
CHEMICAL COMPOSITION
ENTHALPY
THIN FILMS
TRANSMISSION ELECTRON MICROSCOPY
VERY HIGH TEMPERATURE
ELECTRON MICROSCOPY
ELEMENTS
FILMS
METALS
MICROSCOPY
PHASE TRANSFORMATIONS
PHYSICAL PROPERTIES
PLATINUM METALS
THERMODYNAMIC PROPERTIES
TRANSITION ELEMENTS
360102* - Metals & Alloys- Structure & Phase Studies