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Title: Study of SiO[sub 2]-Si and metal-oxide-semiconductor structures using positrons

Journal Article · · Journal of Applied Physics; (United States)
DOI:https://doi.org/10.1063/1.353879· OSTI ID:6771352
; ; ;  [1]
  1. Brookhaven National Laboratory, Upton, New York 11973 (United States)

Studies of SiO[sub 2]-Si and metal-oxide-semiconductor (MOS) structures using positrons are summarized and a concise picture of the present understanding of positrons in these systems is provided. Positron annihilation line-shape [ital S] data are presented as a function of the positron incident energy, gate voltage, and annealing, and are described with a diffusion-annihilation equation for positrons. The data are compared with electrical measurements. Distinct annihilation characteristics were observed at the SiO[sub 2]-Si interface and have been studied as a function of bias voltage and annealing conditions. The shift of the centroid (peak) of [gamma]-ray energy distributions in the depletion region of the MOS structures was studied as a function of positron energy and gate voltage, and the shifts are explained by the corresponding variations in the strength of the electric field and thickness of the depletion layer. The potential role of the positron annihilation technique as a noncontact, nondestructive, and depth-sensitive characterization tool for the technologically important, deeply buried interface is shown.

DOE Contract Number:
AC02-76CH00016
OSTI ID:
6771352
Journal Information:
Journal of Applied Physics; (United States), Vol. 73:1; ISSN 0021-8979
Country of Publication:
United States
Language:
English