Masks for high aspect ratio x-ray lithography
Fabrication of very high aspect ratio microstructures, as well as ultra-high precision manufacturing is of increasing interest in a multitude of applications. Fields as diverse as micromechanics, robotics, integrated optics, and sensors benefit from this technology. The scale-length of this spatial regime is between what can be achieved using classical machine tool operations and that which is used in microelectronics. This requires new manufacturing techniques, such as the LIGA process, which combines x-ray lithography, electroforming, and plastic molding.
- Lawrence Berkeley National Lab., CA (United States)
- Sandia National Labs., Albuquerque, NM (United States)
- Publication Date:
- OSTI Identifier:
- Report Number(s):
ON: DE97007345; TRN: 98:009626
- DOE Contract Number:
- Resource Type:
- Technical Report
- Resource Relation:
- Other Information: PBD: Apr 1997; Related Information: Is Part Of Advanced light source: Compendium of user abstracts 1993--1996; PB: 622 p.
- Research Org:
- Lawrence Berkeley Lab., CA (United States)
- Country of Publication:
- United States
- 42 ENGINEERING NOT INCLUDED IN OTHER CATEGORIES; MASKING; ETCHING; FABRICATION; X RADIATION; MINIATURIZATION
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