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Title: Masks for high aspect ratio x-ray lithography

Fabrication of very high aspect ratio microstructures, as well as ultra-high precision manufacturing is of increasing interest in a multitude of applications. Fields as diverse as micromechanics, robotics, integrated optics, and sensors benefit from this technology. The scale-length of this spatial regime is between what can be achieved using classical machine tool operations and that which is used in microelectronics. This requires new manufacturing techniques, such as the LIGA process, which combines x-ray lithography, electroforming, and plastic molding.
Authors:
;  [1] ; ;  [2]
  1. Lawrence Berkeley National Lab., CA (United States)
  2. Sandia National Labs., Albuquerque, NM (United States)
Publication Date:
OSTI Identifier:
603703
Report Number(s):
LBNL--39981
ON: DE97007345; TRN: 98:009626
DOE Contract Number:
AC03-76SF00098
Resource Type:
Technical Report
Resource Relation:
Other Information: PBD: Apr 1997; Related Information: Is Part Of Advanced light source: Compendium of user abstracts 1993--1996; PB: 622 p.
Research Org:
Lawrence Berkeley Lab., CA (United States)
Country of Publication:
United States
Language:
English
Subject:
42 ENGINEERING NOT INCLUDED IN OTHER CATEGORIES; MASKING; ETCHING; FABRICATION; X RADIATION; MINIATURIZATION