On the decomposition of silane in plasma deposition reactors

Journal Article · Tue Apr 01 00:00:00 EST 1986 · IEEE Trans. Plasma Sci.; (United States)

DOI:https://doi.org/10.1109/TPS.1986.4316519· OSTI ID:5850625

DeJoseph, C A; Haaland, P D; Garscadden, A

In a low-pressure discharge, plasma-enhanced decomposition of silane proceeds by various channels including electron-impact, ion- and radical-induced, and heterogeneous reactions. The results of several experiments are presented to clarify the relative importance of the processes. The conclusions of these studies and associated analysis are that the dominant processes are strongly influenced by the gas residence time, the power density input, and the electronegative characteristics of the silane discharge.

• Research Organization: Air Force Wright Aeronautical Laboratories, Dayton, OH 45433
• OSTI ID: 5850625
• Journal Information: IEEE Trans. Plasma Sci.; (United States), Vol. PS-14:2
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
PLASMA
DEPOSITION
SILANES
DECOMPOSITION
CHEMICAL REACTION KINETICS
CHEMICAL REACTORS
ELECTRONEGATIVITY
POWER DENSITY
PRESSURE DEPENDENCE
TIME DEPENDENCE
CHEMICAL REACTIONS
HYDRIDES
HYDROGEN COMPOUNDS
KINETICS
ORGANIC COMPOUNDS
ORGANIC SILICON COMPOUNDS
REACTION KINETICS
SILICON COMPOUNDS
360601* - Other Materials- Preparation & Manufacture