Characterization of aluminum--aluminum nitride coatings sputter deposited using the pulsed gas process
A dc triode magnetron has been used to produce free-standing Al/Al+AlN lamellar foils by sputter deposition. The 5-..mu..m-thick foils produced on both flat substrates as well as curved substrates exhibited good specularity as well as excellent mechanical properties. The pulse spacing was varied from zero to 100-nm spacing. The yield strength of the material was found to obey the Hall--Petch relation sigma/sub y/s = 230+0.07/d1/2, where sigma/sub y/s is in MPa. Auger electron spectroscopy and secondary ion mass spectroscopy indicate that the large flow stress of 230 MPa must be due to grain refinement of the extended source and not an impurity effect. The result is that limitations of masking found in uniaxial flux sources for curved surfaces can be removed allowing the high quality coating of more general shapes.
- Research Organization:
- Los Alamos National Lab. (LANL), Los Alamos, NM (United States)
- OSTI ID:
- 5576504
- Journal Information:
- J. Vac. Sci. Technol.; (United States), Vol. 20:3
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
GENERAL PHYSICS
ALUMINIUM
VAPOR DEPOSITED COATINGS
ALUMINIUM NITRIDES
AUGER ELECTRON SPECTROSCOPY
ELECTRON MICROSCOPY
ELECTRON SCANNING
ION MICROPROBE ANALYSIS
MASS SPECTROSCOPY
SYNTHESIS
VACUUM COATING
NITROGEN
SPUTTERING
ALUMINIUM OXIDES
FILMS
FOILS
MAGNETRONS
ALUMINIUM COMPOUNDS
CHALCOGENIDES
CHEMICAL ANALYSIS
COATINGS
DEPOSITION
ELECTRON SPECTROSCOPY
ELECTRON TUBES
ELECTRONIC EQUIPMENT
ELEMENTS
EQUIPMENT
METALS
MICROANALYSIS
MICROSCOPY
MICROWAVE EQUIPMENT
MICROWAVE TUBES
NITRIDES
NITROGEN COMPOUNDS
NONDESTRUCTIVE ANALYSIS
NONMETALS
OXIDES
OXYGEN COMPOUNDS
PNICTIDES
SPECTROSCOPY
SURFACE COATING
640301* - Atomic
Molecular & Chemical Physics- Beams & their Reactions