skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Defects and mass transport in rutile-structured fluorides. I. Experiment

Journal Article · · Physical Review (Section) B: Condensed Matter; (USA)
;  [1]
  1. Henry Krumb School of Mines, Columbia University, New York, New York 10027 (US)

A study of low-temperature dielectric relaxation of Er{sup 3+}- and Y{sup 3+}-doped MnF{sub 2} crystals in orientations both parallel and perpendicular to the tetragonal {ital c} axis shows the presence of relaxation peaks with very low activation energies {ital E}. Specifically, for both dopants, a prominent peak is found in parallel-oriented samples with {ital E}{similar to}6 meV and in perpendicular orientation with {ital E}=37 meV for Er{sup 3+} and {ital E}=46 meV for Y{sup 3+} doping. Such low {ital E} values are probably too small to be controlled by lattice migration of a defect. With the aid of computer-simulation calculations, these peaks were interpreted as resulting from a stable low-symmetry configuration of a dopant-F{sub {ital i}} pair (F{sub {ital i}} is the fluorine-ion interstitial), which allows dipole reorientation by motions involving small fractions of lattice distances. It is then concluded that the intrinsic defect in this crystal is of the anion Frenkel, and not the Schottky, type, as had been proposed earlier. Electrical-conductivity measurements on pure and doped MnF{sub 2} were then interpreted in terms of this defect model to obtain {ital H}{sub {ital f}}=3.56{plus minus}0.02 eV for the formation enthalpy of the anion Frenkel defect, {ital H}{sub {ital m}}=0.10 eV for the migration enthalpy of the F{sub {ital i}}, and {ital H}{sub {ital A}}=1.1 eV for the dopant-F{sub {ital i}} association enthalpy. The results agree well with the computer-simulation calculations given in the following paper.

OSTI ID:
5555258
Journal Information:
Physical Review (Section) B: Condensed Matter; (USA), Vol. 40:5; ISSN 0163-1829
Country of Publication:
United States
Language:
English