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Title: Laser induced absorption at 355nm in silica studied by calorimetry and photothermal deflection

Abstract

Laser calorimetry is used to measure low losses of optical samples on the third harmonic of a YAG laser. During the experiments, degradation of bare SiO2 substrate was observed. This degradation consists of an absorption increasing with the laser pulse number. The observed evolution depends on the kind of silica tested and particularly on the OH content of the material. The observed evolution required both changes in the electron content of the existing traps and the creation of new traps or color centers. Using an Argon laser at 351 nm, relaxation of YAG induced absorption was observed. This point enables an evolution mechanism to be proposed related to charge modification of the existing traps and to a multiphoton absorption process during the YAG irradiation.

Authors:
; ; ;  [1]
  1. LETI-CEA-DOPT Couches Minces Optiques, Grenoble (France)
Publication Date:
Research Org.:
International Society for Optical Engineering, Washington, DC (United States)
OSTI Identifier:
552031
Report Number(s):
CONF-9510106-Vol.2714
TRN: 97:005737-0007
Resource Type:
Conference
Resource Relation:
Conference: 27. annual symposium on optical materials for high power lasers, Boulder, CO (United States), 30 Oct - 1 Nov 1995; Other Information: PBD: [1996]; Related Information: Is Part Of Laser-induced damage in optical materials: 1995. Twenty-seventh annual Boulder damage symposium, proceedings; Bennett, H.E.; Guenther, A.H.; Kozlowski, M.R.; Newnam, B.E.; Soileau, M.J. [eds.]; PB: 794 p.
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; 42 ENGINEERING NOT INCLUDED IN OTHER CATEGORIES; SILICA; ABSORPTION; LOSSES; NEAR INFRARED RADIATION; NEODYMIUM LASERS; CALORIMETRY; COLOR CENTERS; TRAPS

Citation Formats

Dijon, J, Van Oost, E, Pelle, C, and Lyan, P. Laser induced absorption at 355nm in silica studied by calorimetry and photothermal deflection. United States: N. p., 1996. Web.
Dijon, J, Van Oost, E, Pelle, C, & Lyan, P. Laser induced absorption at 355nm in silica studied by calorimetry and photothermal deflection. United States.
Dijon, J, Van Oost, E, Pelle, C, and Lyan, P. 1996. "Laser induced absorption at 355nm in silica studied by calorimetry and photothermal deflection". United States.
@article{osti_552031,
title = {Laser induced absorption at 355nm in silica studied by calorimetry and photothermal deflection},
author = {Dijon, J and Van Oost, E and Pelle, C and Lyan, P},
abstractNote = {Laser calorimetry is used to measure low losses of optical samples on the third harmonic of a YAG laser. During the experiments, degradation of bare SiO2 substrate was observed. This degradation consists of an absorption increasing with the laser pulse number. The observed evolution depends on the kind of silica tested and particularly on the OH content of the material. The observed evolution required both changes in the electron content of the existing traps and the creation of new traps or color centers. Using an Argon laser at 351 nm, relaxation of YAG induced absorption was observed. This point enables an evolution mechanism to be proposed related to charge modification of the existing traps and to a multiphoton absorption process during the YAG irradiation.},
doi = {},
url = {https://www.osti.gov/biblio/552031}, journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Dec 31 00:00:00 EST 1996},
month = {Tue Dec 31 00:00:00 EST 1996}
}

Conference:
Other availability
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