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Title: Phenolic dyes as nonbleachable absorbers compatible with novolac resins for linewidth control in photoresists

Patent Application ·
OSTI ID:5409799

Photoresist techniques and compositions are provided employing curcumin as an absorptive dye for the purpose of reducing linewidth non-uniformity caused by scattered and reflective light from the substrate-resist interface. The photoresist compositions containing curcumin as the absorptive dye are used in the production of microelectronic circuitry by both single layer and multilayer photoresist techniques. 2 figs.

Research Organization:
Sandia National Labs., Albuquerque, NM (United States)
Sponsoring Organization:
USDOE; USDOE, Washington, DC (United States)
DOE Contract Number:
AC04-76DP00789
Assignee:
Dept. of Energy
Patent Number(s):
PATENTS-US-A7258543
Application Number:
ON: DE91016973; PPN: US 7-258543
OSTI ID:
5409799
Country of Publication:
United States
Language:
English