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Title: Migration and release of helium-3 implanted in single-crystal nickel

Thesis/Dissertation ·
OSTI ID:5357483

Several nickel single-crystal samples were implanted with 150-keV helium-3 ions to doses between 9.2 x 10/sup 18/ and 2.0 x 10/sup 20/ m/sup -2/. After implantation, the samples were isochronally annealed at various temperatures between 300 and 1300/sup 0/C. Following each annealing step, helium distributions were measured by a nuclear-reaction technique called neutron depth profiling. The technique determines a helium profile from the measured energy distribution of emitted protons produced by the /sup 3/He(n,p)/sup 3/H reaction when a sample is placed in a thermal-neutron beam. The measured profiles were then deconvoluted by an iterative chi-square minimization method. The helium depth profiles can be compared to illustrate helium migration or loss as a function of annealing temperature. Two new results were determined by this experiment and may be summarized as follows. The first results was the demonstration of a helium-concentration-dependent release pattern where one sample with an initial helium dose of about 6 x 10/sup 19/ m/sup -2/ was the most stable and displayed the least amount of helium release up to annealing temperatures as high as 1300/sup 0/C. The second result was the observation that profile peaking (a narrowing of the helium distribution with an increase in peak concentration) occurred for samples with initial doses within a certain range when annealed at 1000/sup 0/C.ng-tool

Research Organization:
Michigan Univ., Ann Arbor (USA)
OSTI ID:
5357483
Resource Relation:
Other Information: Thesis (Ph. D.)
Country of Publication:
United States
Language:
English