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Title: Silicide layer growth rates in Mo/Si multilayers

The thermal stability of sputter-deposited Mo/Si multilayers was investigated by annealing studies at relatively low temperatures ([similar to]250--350 [degree]C) for various times (0.5--3000 h). Two distinct stages of thermally activated Mo/Si interlayer growth were found: a primary surge, followed by a (slower) secondary steady-state growth in which the interdiffusion coefficient is constant. The interdiffusion coefficients for the interlayer formed by deposition of Mo-on-Si are higher than those of the interlayer formed by deposition of Si-on-Mo. Assuming that the activation energy is constant, an extrapolation of our results to ambient temperature finds that interlayer growth is negligible, suggesting long-term thermal stability in soft-x-ray projection lithography applications.
Authors:
;  [1] ; ;  [2] ;  [3] ;  [4]
  1. (Lawrence Livermore National Laboratory, P.O. Box 808, Livermore, California 94550 (United States))
  2. (Department of Mechanical Engineering, Oregon State University, Corvallis, Oregon 97331 (United States))
  3. (Vernon Applied Physics, P.O. Box 10469, Torrance, California 90505 (United States))
  4. (Department of Physics, Arizona State University, Tempe, Arizona 85287 (United States))
Publication Date:
OSTI Identifier:
5295150
DOE Contract Number:
W-7405-ENG-48
Resource Type:
Journal Article
Resource Relation:
Journal Name: Applied Optics; (United States); Journal Volume: 32:34
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; MOLYBDENUM; ANNEALING; SILICON; DIFFUSION; LAYERS; REFLECTIVITY; SOFT X RADIATION; SPUTTERING; TEMPERATURE RANGE 0400-1000 K; THERMODYNAMIC PROPERTIES; ELECTROMAGNETIC RADIATION; ELEMENTS; HEAT TREATMENTS; IONIZING RADIATIONS; METALS; OPTICAL PROPERTIES; PHYSICAL PROPERTIES; RADIATIONS; SEMIMETALS; SURFACE PROPERTIES; TEMPERATURE RANGE; TRANSITION ELEMENTS; X RADIATION 360104* -- Metals & Alloys-- Physical Properties; 360606 -- Other Materials-- Physical Properties-- (1992-)