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Title: Substrate having high absorptance and emitance black electroless nicel coating and a process for producing the same

Patent ·
OSTI ID:5281236

A substrate having high absorptance and emittance is produced by roughening the surface of the substrate, immersing the substrate in a first electroless plating bath having a low phosphorus to nickel concentration, then immersing the substrate in a second electroless plating bath having a phosphorus to nickel concentration higher than that of said first electroless plating bath. Thereafter, the resulting electroless nickel-phosphorus alloy coated substrate is immersed in an aqueous acidic etchant bath containing sulfuric acid, nitric acid and divalent nickel to develop a highly blackened surface on said substrate.

Assignee:
Ball Corp.
Patent Number(s):
US 4511614
OSTI ID:
5281236
Resource Relation:
Patent File Date: Filed date 31 Oct 1983; Other Information: PAT-APPL-546780
Country of Publication:
United States
Language:
English