High surface area electrode research. Final technical report, 10 July-31 December 1996
Molybdenum nitride (MOxN (x=1 or 2)) films, 15 micron thick, have been deposited via chemical vapor deposition (CVD) on 50 micron thick polycrystalline titanium substrates using molybdenum pentachloride (MoCl5) and NH3 in a cold wall reactor with vertical pancake heaters. The surface morphology of the films was slightly porous but did not contain the large cracks typical of high surface area MOxN films prepared by conversion of MoO3. Debye-Scherrer calculations indicate that the average particle size of the films was approximately 50 nm. The CvD MOxN films had a two-phase structure which appeared to be 60% d-MoN and 40% g-Mo2N. Energy dispersive X-ray (EDX) data did not reveal the presence of oxygen and chlorine in films deposited above 6000 C. Electrode evaluation via AC impedance spectroscopy and cyclic voltammetry indicates that CVD films were capacitive with a voltage stability of 0.9 volts in 6.4M KOH.
- Research Organization:
- North Carolina State Univ., Raleigh, NC (United States). Dept. of Materials Science and Engineering
- OSTI ID:
- 459629
- Report Number(s):
- AD-A-319434/7/XAB; CNN: Contract N00014-96-1-1109; TRN: 70760186
- Resource Relation:
- Other Information: PBD: 31 Dec 1996
- Country of Publication:
- United States
- Language:
- English
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