Deposition of superhard amorphous carbon films by pulsed arc sources
Conference
·
OSTI ID:441562
- Fraunhofer-Institut fuer Werkstoffphysik und Schichttechnologie, Dresden (Germany)
Hydrogen-free amorphous carbon films with hardness comparable to crystalline superhard materials have been deposited by special Pulsed arc techniques. By the combination of very high hardness, low adhesion and high smoothness, these films show superior behaviour in wear and glide applications. The influence of plasma and deposition conditions on these film properties and the choice of optimum conditions are discussed.
- OSTI ID:
- 441562
- Report Number(s):
- CONF-960723-; TRN: 96:006574-0035
- Resource Relation:
- Conference: 17. international symposium on discharges and electrical insulation in vacuum, Berkeley, CA (United States), 21-26 Jul 1996; Other Information: PBD: 1996; Related Information: Is Part Of XVIIth international symposium on discharges and electrical insulation in vacuum. Volume 1 and 2; PB: 1139 p.
- Country of Publication:
- United States
- Language:
- English
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