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Title: The role of substrate point defects in adhesion of metal films

Abstract

As known, nucleation and epitaxial growth of metal films are affected by point defects of substrate surface, F-centers in particular, but their effect on adhesion of thin films has not yet been thoroughly studied. Despite the fact that the point defects are usually taken into account when the adhesion activation by various irradiation treatments is discussed, their role has not been properly revealed. This is due to the difficulties of the accurate control of the type and the density of the point defects in subsurface region as well as to the fact that the radiation treatment of surfaces can produce some changes in the chemical composition and stoichiometry of the surface, in addition to the creation of the point defects. For the purpose of the study of the effect of point defects on the adhesion of thin films, the author approached the problem in a principally different way: the author created point defects in the bulk of the crystals, controlled the type and the bulk density of the defects and then cleaved the crystals in vacuum - in a stream of metal vapors. The fresh, free from contaminants contact of metal film with the crystal surface enriched with point defectsmore » was created in this way.« less

Authors:
 [1]
  1. Israel Inst. of Technoloty, Hiafa (Israel)
Publication Date:
OSTI Identifier:
441500
Report Number(s):
CONF-960214-
TRN: 96:006556-0033
Resource Type:
Conference
Resource Relation:
Conference: 19. annual meeting of the Adhesion Society, Inc, Myrtle Beach, SC (United States), 18-21 Feb 1996; Other Information: PBD: 1996; Related Information: Is Part Of Proceedings of the 19th annual meeting of the Adhesion Society; Ward, T.C. [ed.]; PB: 567 p.
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; SILVER; ADHESION; LITHIUM FLUORIDES; POINT DEFECTS; PARAMETRIC ANALYSIS; FILMS; MONOCRYSTALS

Citation Formats

Stolyarova, S. The role of substrate point defects in adhesion of metal films. United States: N. p., 1996. Web.
Stolyarova, S. The role of substrate point defects in adhesion of metal films. United States.
Stolyarova, S. 1996. "The role of substrate point defects in adhesion of metal films". United States.
@article{osti_441500,
title = {The role of substrate point defects in adhesion of metal films},
author = {Stolyarova, S},
abstractNote = {As known, nucleation and epitaxial growth of metal films are affected by point defects of substrate surface, F-centers in particular, but their effect on adhesion of thin films has not yet been thoroughly studied. Despite the fact that the point defects are usually taken into account when the adhesion activation by various irradiation treatments is discussed, their role has not been properly revealed. This is due to the difficulties of the accurate control of the type and the density of the point defects in subsurface region as well as to the fact that the radiation treatment of surfaces can produce some changes in the chemical composition and stoichiometry of the surface, in addition to the creation of the point defects. For the purpose of the study of the effect of point defects on the adhesion of thin films, the author approached the problem in a principally different way: the author created point defects in the bulk of the crystals, controlled the type and the bulk density of the defects and then cleaved the crystals in vacuum - in a stream of metal vapors. The fresh, free from contaminants contact of metal film with the crystal surface enriched with point defects was created in this way.},
doi = {},
url = {https://www.osti.gov/biblio/441500}, journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Dec 31 00:00:00 EST 1996},
month = {Tue Dec 31 00:00:00 EST 1996}
}

Conference:
Other availability
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