Strongly localized donor level in oxygen doped gallium nitride
Conference
·
OSTI ID:434361
- Lawrence Berkeley National Lab., CA (United States)
- Giessen Univ. (Germany). 1. Physikalisches Inst.
- Polska Akademia Nauk, Warsaw (Poland)
A classification in terms of localization of donor defects in GaN is performed by Raman spectroscopy under large hydrostatic pressure. We observe a significant decrease of free carrier concentration in highly O doped GaN epitaxial films at 22 GPa, indicating the presence of a strongly localized donor defect at large pressure. Monitoring the phonon plasmon coupled mode, we find similarities with results on highly n-type bulk crystals. We refine the model of localized defects in GaN and transfer it to the AlGaN system.
- Research Organization:
- Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
- Sponsoring Organization:
- USDOE Office of Energy Research, Washington, DC (United States)
- DOE Contract Number:
- AC03-76SF00098
- OSTI ID:
- 434361
- Report Number(s):
- LBNL-39218; CONF-960781-8; ON: DE97001220
- Resource Relation:
- Conference: International conference on physics of semiconductors, Berlin (Germany), 21-26 Jul 1996; Other Information: PBD: Aug 1996
- Country of Publication:
- United States
- Language:
- English
Similar Records
Carrier localization of as-grown {ital n}-type gallium nitride under large hydrostatic pressure
Carrier localization in gallium nitride
Strongly localized excitons in gallium nitride
Journal Article
·
Mon Jan 01 00:00:00 EST 1996
· Physical Review, B: Condensed Matter
·
OSTI ID:434361
+4 more
Carrier localization in gallium nitride
Conference
·
Sun Sep 01 00:00:00 EDT 1996
·
OSTI ID:434361
Strongly localized excitons in gallium nitride
Journal Article
·
Mon Apr 01 00:00:00 EST 1996
· Applied Physics Letters
·
OSTI ID:434361
+5 more