Ion-beam assisted, electron-beam physical vapor deposition
- Pennsylvania State Univ., University Park, PA (United States)
Electron beam-physical vapor deposition (EB-PVD) is a relatively new technology that has overcome some of the difficulties associated with chemical vapor deposition, physical vapor deposition, and thermal spray processes. In the EB-PVD process, focused high-energy electron beams generated from electron guns are directed to melt and evaporate ingots, as well as preheat the substrate inside a vacuum chamber. By adding the assistance of ion beams to the process, coating density and adhesion are improved, while costs are reduced. This article describes physical vapor deposition and ion-beam processes, explains the advantages of EB-PVD, shows how ion beams optimize the benefits of EB-PVD, and enumerates a variety of applications.
- OSTI ID:
- 417925
- Journal Information:
- Advanced Materials and Processes, Vol. 150, Issue 6; Other Information: PBD: Dec 1996
- Country of Publication:
- United States
- Language:
- English
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