skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Breakdown voltage improvement of standard MOS technologies targeted at smart power

Conference ·
OSTI ID:415488
; ;  [1]; ;  [2]
  1. Inst. Superior Tecnico-CEAUTL, Lisboa (Portugal)
  2. Fundacao Centro Technologico para Informatica, Campinas, Sao Paulo (Brazil)

This paper presents and discusses trade-offs of three different design techniques intended to improve the breakdown voltage of n-type lateral medium power transistors to be fabricated in a conventional low cost CMOS technology. A thorough analysis of the static and dynamic characteristics of the modified structures was carried out with the support of a two-dimensional device simulator. The motivation behind this work was the construction of a low cost smart power microsystem, including control, sensing and protection circuitries, targeted at an electronic ballast for efficient control of the power delivered to fluorescent lamps.

OSTI ID:
415488
Report Number(s):
CONF-9510203-; TRN: IM9704%%119
Resource Relation:
Conference: IEEE/Industrial Application Society conference, Orlando, FL (United States), 8-12 Oct 1995; Other Information: PBD: 1995; Related Information: Is Part Of Conference record of the 1995 IEEE Industry Applications Society thirtieth IAS annual meeting. Volume 2; PB: 954 p.
Country of Publication:
United States
Language:
English