Breakdown voltage improvement of standard MOS technologies targeted at smart power
Conference
·
OSTI ID:415488
- Inst. Superior Tecnico-CEAUTL, Lisboa (Portugal)
- Fundacao Centro Technologico para Informatica, Campinas, Sao Paulo (Brazil)
This paper presents and discusses trade-offs of three different design techniques intended to improve the breakdown voltage of n-type lateral medium power transistors to be fabricated in a conventional low cost CMOS technology. A thorough analysis of the static and dynamic characteristics of the modified structures was carried out with the support of a two-dimensional device simulator. The motivation behind this work was the construction of a low cost smart power microsystem, including control, sensing and protection circuitries, targeted at an electronic ballast for efficient control of the power delivered to fluorescent lamps.
- OSTI ID:
- 415488
- Report Number(s):
- CONF-9510203-; TRN: IM9704%%119
- Resource Relation:
- Conference: IEEE/Industrial Application Society conference, Orlando, FL (United States), 8-12 Oct 1995; Other Information: PBD: 1995; Related Information: Is Part Of Conference record of the 1995 IEEE Industry Applications Society thirtieth IAS annual meeting. Volume 2; PB: 954 p.
- Country of Publication:
- United States
- Language:
- English
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