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Title: A 3-D numerical study of pinhole diffraction to predict the accuracy of EUV point diffraction interferometry

A 3-D electromagnetic field simulation is used to model the propagation of extreme ultraviolet (EUV), 13-nm, light through sub-1500 {Angstrom} dia pinholes in a highly absorptive medium. Deviations of the diffracted wavefront phase from an ideal sphere are studied within 0.1 numerical aperture, to predict the accuracy of EUV point diffraction interferometersused in at-wavelength testing of nearly diffraction-limited EUV optical systems. Aberration magnitudes are studied for various 3-D pinhole models, including cylindrical and conical pinhole bores.
Authors:
 [1] ;  [2] ;  [3]
  1. Lawrence Berkeley National Lab., CA (United States)|[California Univ., Berkeley, CA (United States). Dept. of Physics
  2. California Univ., Berkeley, CA (United States). Dept. of Electrical Engineering and Computer Sciences
  3. Lawrence Berkeley National Lab., CA (United States)|[California Univ., Berkeley, CA (United States). Dept. of Electrical Engineering and Computer Sciences
Publication Date:
OSTI Identifier:
378219
Report Number(s):
LBL--38157; CONF-960493--15
ON: DE96013723
DOE Contract Number:
AC03-76SF00098
Resource Type:
Conference
Resource Relation:
Conference: Optical Society of America (OSA) meeting on integrated photonics research, Boston, MA (United States), 29 Apr - 3 May 1996; Other Information: PBD: Dec 1995
Research Org:
Lawrence Berkeley National Lab., CA (United States)
Sponsoring Org:
USDOE, Washington, DC (United States)
Country of Publication:
United States
Language:
English
Subject:
44 INSTRUMENTATION, INCLUDING NUCLEAR AND PARTICLE DETECTORS; EXTREME ULTRAVIOLET RADIATION; DIFFRACTION; INTERFEROMETERS; OPTICAL SYSTEMS; TESTING; INTERFEROMETRY