skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Formation of nitroaromatic compounds in advanced oxidation processes: Photolysis versus photocatalysis

Journal Article · · Environmental Science and Technology
DOI:https://doi.org/10.1021/es980358j· OSTI ID:318750
; ;  [1]
  1. Inst. fuer Solarenergieforschung GmbH Hameln/Emmerthal, Hannover (Germany)

There is a growing demand for efficient treatment of organic polluted wastewaters by advanced oxidation processes (AOPs). Besides optimization of the processes, the detailed understanding of degradation mechanisms and interactions of organic pollutants with inorganic substrates is important for technical applications of AOPs. Therefore, the aim of the present study was to investigate the influence of nitrate ions on the photooxidation of phenol for various AOPs at different pH values. Three different oxidation processes were compared in these studies: direct photolysis, TiO{sub 2}/UV, and H{sub 2}O{sub 2}/UV. Special emphasis has been laid on the analysis of byproducts especially on the formation of nitroaromatic compounds. The formation of intermediates as well as the depletion of phenol were monitored by HPLC technique. The total organic carbon content, TOC, was measured to monitor the mineralization. Highest degradation rates and lowest concentrations of intermediates were observed with TiO{sub 2}/UV being the AOP. Formation of highly toxic nitrophenols was only observed when homogeneous AOPs were employed. For the TiO{sub 2}/UV process no formation of Nitroaromatic byproducts occurred. At pH 5 formation of nitrophenols was observed employing direct photolysis in the presence of NO{sub 2}{sup {minus}}, while with H{sub 2}O{sub 2}/UV nitrophenols were detected only when the concentration of NO{sub 2}{sup {minus}} was higher than that of H{sub 2}O{sub 2}. At pH 11 no nitroaromatic intermediates were found for any AOPs compared in this study.

OSTI ID:
318750
Journal Information:
Environmental Science and Technology, Vol. 33, Issue 2; Other Information: PBD: 15 Jan 1999
Country of Publication:
United States
Language:
English