Organic thin film deposition in atmospheric pressure glow discharge
- Sophia University, Kioi-cho 7-1, Chiyoda-ku, Tokyo 102 (Japan)
- Ministry of International Trade and Industry, Agency of Industrial Science and Technology, Higashi 1-1-4, Tsukuba-shi, Ibarki-k en 305 (Japan)
- Kawasumi Laboratories, Inc., Tamada 7-1, Miemachi, Ohno-gun, Ohita-ken 879-71 (Japan)
The stabilization of a homogeneous glow discharge at atmospheric pressure has been studied since 1987. On flat surfaces, various plasma surface treatments and film depositions at atmospheric pressure have been examined. A practical application of the atmospheric pressure glow plasma on inner surfaces of flexible polyvinyl chloride tubes was tested for thin film deposition of polytetrafluoroethylene. Deposited film surfaces were characterized by ESCA and FT-IR/ATR measurements. Also SEM observation was done for platelet adhesion on the plasma treated polyvinyl chloride surface. These results showed remarkable enhancement in the inhibition to platelet adhesion on the inner surface of PVC tube, and homogeneous organic film deposition was confirmed. The deposition mechanism of polytetrafluoroethylene film in atmospheric pressure glow plasma is the same as the mechanism of film formation in the low pressure glow plasma, except for radical formation source. {copyright} {ital 1996 American Institute of Physics.}
- Sponsoring Organization:
- USDOE
- OSTI ID:
- 286462
- Report Number(s):
- CONF-950119-; ISSN 0094-243X; TRN: 96:022372
- Journal Information:
- AIP Conference Proceedings, Vol. 354, Issue 1; Conference: 53. international meeting of physical chemistry: organic coatings, Paris (France), 2-6 Jan 1995; Other Information: PBD: Jan 1996
- Country of Publication:
- United States
- Language:
- English
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