Perpendicular giant magnetoresistance in a 0.4 {mu}m diameter multilayer sensor
We have fabricated a novel GMR ML flux sensor that is designed to operate in the CPP mode. The GMR sensor is a 0.4 {mu}m diameter, 0.09 {mu}m high Cu-Co ML pedestal. The sensors are patterned using electron beam lithography. The Al{sub 2}O{sub 3}-TiC substrate is coated with a sputter deposited Al{sub 2}O{sub 3} film that is polished to <0.2 nm RMS roughness. Contact to the bottom of the GMR sensor is made by depositing the Cu-Co multilayers onto a smooth 0.45 {mu}m thick Mo-Si ML stack. The top contact is self-aligned to the GMR sensor. This is accomplished, in part, by CMP. The top and bottom contact layers are electrically isolated by a PECVD Si{sub 3}N{sub 4} film. The configuration of the contacts allows four point probe resistance measurements. The GMR response of these 0.4 {mu}m diameter sensors is 12%.
- Research Organization:
- Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
- Sponsoring Organization:
- USDOE, Washington, DC (United States)
- DOE Contract Number:
- W-7405-ENG-48
- OSTI ID:
- 226400
- Report Number(s):
- UCRL-JC-123000; CONF-960425-7; ON: DE96009807; TRN: 96:002812
- Resource Relation:
- Conference: 1996 IEEE international magnetics conference, Seattle, WA (United States), 9-12 Apr 1996; Other Information: PBD: 29 Feb 1996
- Country of Publication:
- United States
- Language:
- English
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