Ion temperature and gas pressure effects on the magnetized sheath dynamics during plasma immersion ion implantation
- Department of Physics, Borujerd Branch, Islamic Azad University, Borujerd (Iran, Islamic Republic of)
- Laser and Plasma Research Institute, Shahid Beheshti University, Evin, 1983963113 Tehran (Iran, Islamic Republic of)
Here, a collisional magnetized plasma with finite ion temperature is considered to examine the effects of the ion temperature and gas pressure on the plasma-sheath dynamics. We use the two-fluid model of plasma-sheath where the nonlinear equations of a dynamic sheath are solved using a full implicit scheme of finite difference method along with some convenient initial and boundary conditions at the plasma center and target. It is found that the ion temperature only has a significant effect on the characteristics of low voltage sheath, while the gas pressure (collision rate) seriously affects the dynamic characteristics of the low and high voltage plasma-sheath. One can see, increasing the ion temperature in low voltage plasma-sheath causes to increase the temporal curve of the ion dose and the ion impact energy on the target, reduces the temporal curve of the sheath width, and has no any effect on the temporal curve of the ion incident angle on the target. However, rising the gas pressure in low and high voltage plasma-sheath reduces all of these temporal curves.
- OSTI ID:
- 22599085
- Journal Information:
- Physics of Plasmas, Vol. 23, Issue 3; Other Information: (c) 2016 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 1070-664X
- Country of Publication:
- United States
- Language:
- English
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