Fabrication of a multilevel THz Fresnel lens by femtosecond laser ablation

Journal Article · Sat Oct 31 00:00:00 EDT 2015 · Quantum Electronics (Woodbury, N.Y.)

DOI:https://doi.org/10.1070/QE2015V045N10ABEH015890· OSTI ID:22551162

Komlenok, M S; Kononenko, T V; Kononenko, V V; Konov, V I ^[1]; Volodkin, B O; Tukmakov, K N ^[2]; Knyazev, B A; Choporova, Yu Yu ^[3]; Soifer, V A; Pavel'ev, V S ^[4]

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1. A M Prokhorov General Physics Institute, Russian Academy of Sciences, Moscow (Russian Federation)
2. S.P. Korolev Samara State Aerospace University, Samara (Russian Federation)
3. Budker Institute of Nuclear Physics, Siberian Branch of the Russian Academy of Sciences, Novosibirsk (Russian Federation)
4. Image Processing Systems Institute, Russian Academy of Sciences, Samara (Russian Federation)

The possibility of fabricating a silicon diffractive fourlevel THz Fresnel lens by laser ablation is studied. For a microrelief to be formed on the sample surface, use is made of a femtosecond Yb : YAG laser with a high pulse repetition rate (f = 200 kHz). Characteristics of the diffractive optical element are investigated in the beam of a 141-mm free-electron laser. The measured diffraction efficiency of the lens is in good agreement with the theoretical estimate. (laser technologies)

• OSTI ID: 22551162
• Journal Information: Quantum Electronics (Woodbury, N.Y.), Vol. 45, Issue 10; Other Information: Country of input: International Atomic Energy Agency (IAEA); ISSN 1063-7818
• Country of Publication: United States
• Language: English

Related Subjects

46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY
ABLATION
DIFFRACTION
FREE ELECTRON LASERS
FRESNEL LENS
KHZ RANGE
NEODYMIUM LASERS
PHOTON BEAMS
PULSES
SILICON
SURFACES