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Title: Pulsed laser deposition of air-sensitive hydride epitaxial thin films: LiH

We report on the epitaxial thin film growth of an air-sensitive hydride, lithium hydride (LiH), using pulsed laser deposition (PLD). We first synthesized a dense LiH target, which is key for PLD growth of high-quality hydride films. Then, we obtained epitaxial thin films of [100]-oriented LiH on a MgO(100) substrate at 250 °C under a hydrogen pressure of 1.3 × 10{sup −2} Pa. Atomic force microscopy revealed that the film demonstrates a Stranski-Krastanov growth mode and that the film with a thickness of ∼10 nm has a good surface flatness, with root-mean-square roughness R{sub RMS} of ∼0.4 nm.
Authors:
 [1] ;  [2] ;  [3] ;  [4] ;  [1] ; ;  [5] ;  [5] ;  [4]
  1. Department of Nanomechanics, Tohoku University, Sendai 980-8579 (Japan)
  2. (muSIC), Tohoku University, Sendai 980-0845 (Japan)
  3. Creative Research Institution, Hokkaido University, Sapporo 001-0021 (Japan)
  4. (Japan)
  5. Advanced Institute for Materials Research (AIMR), Tohoku University, Sendai 980-8577 (Japan)
Publication Date:
OSTI Identifier:
22499241
Resource Type:
Journal Article
Resource Relation:
Journal Name: APL Materials; Journal Volume: 3; Journal Issue: 9; Other Information: (c) 2015 Author(s); Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; ATOMIC FORCE MICROSCOPY; ENERGY BEAM DEPOSITION; EPITAXY; LASER RADIATION; LITHIUM HYDRIDES; MAGNESIUM OXIDES; PULSED IRRADIATION; SUBSTRATES; SURFACES; THIN FILMS