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Title: Effect of substrate rotation on domain structure and magnetic relaxation in magnetic antidot lattice arrays

Microdimensional triangular magnetic antidot lattice arrays were prepared by varying the speed of substrate rotation. The pre-deposition patterning has been performed using photolithography technique followed by a post-deposition lift-off. Surface morphology taken by atomic force microscopy depicted that the growth mechanism of the grains changes from chain like formation to island structures due to the substrate rotation. Study of magnetization reversal via magneto optic Kerr effect based microscopy revealed reduction of uniaxial anisotropy and increase in domain size with substrate rotation. The relaxation measured under constant magnetic field becomes faster with rotation of the substrate during deposition. The nature of relaxation for the non-rotating sample can be described by a double exponential decay. However, the relaxation for the sample with substrate rotation is well described either by a double exponential or a Fatuzzo-Labrune like single exponential decay, which increases in applied field.
Authors:
; ;  [1]
  1. Laboratory for Nanomagnetism and Magnetic Materials (LNMM), School of Physical Sciences, National Institute of Science Education and Research (NISER), Bhubaneswar 751005 (India)
Publication Date:
OSTI Identifier:
22494790
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Applied Physics; Journal Volume: 118; Journal Issue: 8; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; ANISOTROPY; ATOMIC FORCE MICROSCOPY; DEPOSITION; DOMAIN STRUCTURE; GRAIN GROWTH; KERR EFFECT; MAGNETIC FIELDS; MAGNETIC ISLANDS; MAGNETIZATION; MORPHOLOGY; RELAXATION; SUBSTRATES; SURFACES; VELOCITY