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Title: One dimensional focusing with high numerical aperture multilayer Laue lens

Multilayer Laue lenses (MLLs) capitalize on the developments in multilayer deposition technologies for fabricating reflective coatings, specifically undertaken for EUV lithography, where layer thicknesses of several nanometers can be achieved. MLLs are deposited layer by layer, with their thicknesses following the zone plate law, and then pieces are sliced and extracted for use in focusing. Rays are reflected in the Laue geometry. The efficiency of a MLL can be very high, and is maximized by making the slice equal to about a half Pendellosung period so that most energy is transferred from the undiffracted to the diffracted beam, and by ensuring that the Bragg condition is met at each point in the zone plate. This latter condition requires that the layers are tilted to the beam by an amount that varies with layer position; e.g. for focusing a collimated beam, the layers should be normal to a cylinder of radius of twice the focal length. We have fabricated such tilted-zone MLLs and find that they exhibit improved efficiency across their entire pupil as compared with parallel-zone MLLs. This leads to a higher effective NA of the optic and hence higher resolution.
Authors:
;  [1] ;  [2] ;  [2] ;  [3] ;  [3] ;  [4] ;  [5]
  1. Photon Science, DESY, Notkestrasse 85, 22607 Hamburg (Germany)
  2. Center for Free-Electron Laser Science, DESY, Notkestrasse 85, 22607 Hamburg (Germany)
  3. (Germany)
  4. SLAC, 2575 Sand Hill Rd., Menlo Park, CA 94025 (United States)
  5. Faculty of Physics, University of Bialystok, K. Ciolkowskiego 1L, 15-245, Bialystok (Poland)
Publication Date:
OSTI Identifier:
22494407
Resource Type:
Journal Article
Resource Relation:
Journal Name: AIP Conference Proceedings; Journal Volume: 1696; Journal Issue: 1; Conference: XRM 2014: 12. international conference on X-ray microscopy, Melbourne (Australia), 26-31 Oct 2014; Other Information: (c) 2016 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; APERTURES; BEAMS; COMPARATIVE EVALUATIONS; CYLINDERS; DEPOSITION; DEPOSITS; EFFICIENCY; FOCUSING; GEOMETRY; LAUE METHOD; LAYERS; LENSES; ONE-DIMENSIONAL CALCULATIONS; REFLECTIVE COATINGS; RESOLUTION; THICKNESS