skip to main content

Title: Inedible cellulose-based biomass resist material amenable to water-based processing for use in electron beam lithography

An electron beam (EB) lithography method using inedible cellulose-based resist material derived from woody biomass has been successfully developed. This method allows the use of pure water in the development process instead of the conventionally used tetramethylammonium hydroxide and anisole. The inedible cellulose-based biomass resist material, as an alternative to alpha-linked disaccharides in sugar derivatives that compete with food supplies, was developed by replacing the hydroxyl groups in the beta-linked disaccharides with EB-sensitive 2-methacryloyloxyethyl groups. A 75 nm line and space pattern at an exposure dose of 19 μC/cm{sup 2}, a resist thickness uniformity of less than 0.4 nm on a 200 mm wafer, and low film thickness shrinkage under EB irradiation were achieved with this inedible cellulose-based biomass resist material using a water-based development process.
Authors:
; ; ; ;  [1]
  1. Toyama Prefectural University, Imizu, Toyama 939-0398 (Japan)
Publication Date:
OSTI Identifier:
22493952
Resource Type:
Journal Article
Resource Relation:
Journal Name: AIP Advances; Journal Volume: 5; Journal Issue: 7; Other Information: (c) 2015 Author(s); Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
37 INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY; ANISOLE; BIOMASS; CELLULOSE; ELECTRON BEAMS; FILMS; FOOD; HYDROXIDES; IRRADIATION; MASKING; PROCESSING; RADIATION DOSES; RADIATION EFFECTS; SACCHAROSE; SHRINKAGE; WATER