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Title: Influence of etching processes on electronic transport in mesoscopic InAs/GaSb quantum well devices

We report the electronic characterization of mesoscopic Hall bar devices fabricated from coupled InAs/GaSb quantum wells sandwiched between AlSb barriers, an emerging candidate for two-dimensional topological insulators. The electronic width of the etched structures was determined from the low field magneto-resistance peak, a characteristic signature of partially diffusive boundary scattering in the ballistic limit. In case of dry-etching the electronic width was found to decrease with electron density. In contrast, for wet etched devices it stayed constant with density. Moreover, the boundary scattering was found to be more specular for wet-etched devices, which may be relevant for studying topological edge states.
Authors:
; ; ; ; ; ;  [1]
  1. Solid State Physics Laboratory, ETH Zürich - 8093 Zürich (Switzerland)
Publication Date:
OSTI Identifier:
22493931
Resource Type:
Journal Article
Resource Relation:
Journal Name: AIP Advances; Journal Volume: 5; Journal Issue: 7; Other Information: (c) 2015 Author(s); Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; 77 NANOSCIENCE AND NANOTECHNOLOGY; ALUMINIUM COMPOUNDS; DIELECTRIC MATERIALS; ELECTRON DENSITY; ETCHING; GALLIUM ANTIMONIDES; HALL EFFECT; INDIUM ARSENIDES; MAGNETORESISTANCE; QUANTUM WELLS; SCATTERING; TWO-DIMENSIONAL SYSTEMS