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Title: In-situ investigation of graphene oxide under UV irradiation: Evolution of work function

Using in-situ Kelvin probe force microscopy (KPFM) to measure surface potential, we investigated the time-dependent work function evolution of solution-processed graphene oxide (GO) under ultraviolet (UV) irradiation. We found that the work function of GO exposed in UV shows a notable decrease with increasing irradiation time, which is proposed to be attributed to the gradual disappearance of oxygen-containing functional groups in GO during the UV-induced reduction reaction process. Fourier transform infrared spectrum and Raman spectrum were used to confirm the reduction of GO under UV irradiation. Our study would give an insight into understanding the transformation of GO’s electronic structures during the reduction process.
Authors:
; ; ; ;  [1] ;  [2]
  1. Hunan Provincial Key Laboratory of Micro-Nano Energy Materials and Devices and School of Physics and Optoelectronics, Xiangtan University, Hunan 411105 (China)
  2. (China)
Publication Date:
OSTI Identifier:
22493914
Resource Type:
Journal Article
Resource Relation:
Journal Name: AIP Advances; Journal Volume: 5; Journal Issue: 6; Other Information: (c) 2015 Author(s); Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; CARBON OXIDES; ELECTRONIC STRUCTURE; FOURIER TRANSFORMATION; GRAPHENE; INFRARED SPECTRA; IRRADIATION; MATHEMATICAL SOLUTIONS; MICROSCOPY; OXYGEN; PROBES; RAMAN SPECTRA; RAMAN SPECTROSCOPY; REDUCTION; SURFACE POTENTIAL; TIME DEPENDENCE; ULTRAVIOLET RADIATION; WORK FUNCTIONS