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Title: Up- and downstream sheaths in an ion-beam-plasma system

Ion sheaths formed in the up- and downstream sides of a negatively biased metal plate/mesh in an ion-beam-background-plasma system were experimentally investigated in a double plasma device. Measured potential profiles near the plate exhibit asymmetric structure, showing thicker sheath in the downstream side. The presence of the ion beam causes the shrink of the sheaths on both sides. The sheath thickness decreases with the increase of beam energy and density. Furthermore, the sheaths near the mesh are substantially thinner than that near the plate because of the partial transmission of the mesh to the ions. In addition, the increase of neutral gas pressure leads to the reduction of the beam energy and density, resulting in the increase of the sheath thickness.
Authors:
;  [1]
  1. CAS Key Laboratory of Geospace Environment and Department of Modern Physics, University of Science and Technology of China, Hefei, Anhui 230026 (China)
Publication Date:
OSTI Identifier:
22493891
Resource Type:
Journal Article
Resource Relation:
Journal Name: Physics of Plasmas; Journal Volume: 23; Journal Issue: 2; Other Information: (c) 2016 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
70 PLASMA PHYSICS AND FUSION TECHNOLOGY; ASYMMETRY; BEAM-PLASMA SYSTEMS; EXPERIMENT RESULTS; ION BEAMS; PLASMA; PLASMA SHEATH; PLATES; POTENTIALS