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Title: Self-consistent drift-diffusion-reaction model for the electron beam interaction with dielectric samples

The charging of insulating samples degrades the quality and complicates the interpretation of images in scanning electron microscopy and is important in other applications, such as particle detectors. In this paper, we analyze this nontrivial phenomenon on different time scales employing the drift-diffusion-reaction approach augmented with the trapping rate equations and a realistic semi-empirical source function describing the pulsed nature of the electron beam. We consider both the fast processes following the impact of a single primary electron, the slower dynamics resulting from the continuous bombardment of a sample, and the eventual approach to the steady-state regime.
Authors:
; ;  [1]
  1. Delft Institute of Applied Mathematics, Delft University of Technology, Mekelweg 4, 2628 CD Delft (Netherlands)
Publication Date:
OSTI Identifier:
22492967
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Applied Physics; Journal Volume: 118; Journal Issue: 20; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; DIELECTRIC MATERIALS; DIFFUSION; ELECTRON BEAMS; IMAGES; INTERACTIONS; PULSES; REACTION KINETICS; SCANNING ELECTRON MICROSCOPY; STEADY-STATE CONDITIONS; TRAPPING