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Title: Perpendicular coercivity enhancement of CoPt/TiN films by nitrogen incorporation during deposition

The effect of N incorporation on the structure and magnetic properties of CoPt thin films deposited on glass substrates with TiN seed layers has been investigated. During the deposition of CoPt, introducing 20% N{sub 2} into Ar atmosphere promotes the (001) texture and enhances the perpendicular coercivity of CoPt film compared with the film deposited in pure Ar and post-annealed under the same conditions. From the in situ x-ray diffraction results, it is confirmed that N incorporation expands the lattice parameter of CoPt, which favors the epitaxial growth of CoPt on TiN. During the post-annealing process, N releases from CoPt film and promotes the L1{sub 0} ordering transformation of CoPt.
Authors:
; ; ; ; ;  [1] ;  [2] ; ;  [3]
  1. Department of Metallurgy and Ceramics Science, Tokyo Institute of Technology, 2-12-1, Ookayama, Meguro-ku, Tokyo 152-8552 (Japan)
  2. National Institute for Materials Science (NIMS), Sengen 1-2-1, Tsukuba, Ibaraki 305-0047 (Japan)
  3. Hungarian Academy of Sciences, Research Institute for Technical Physics and Materials Science, H-1121 Budapest, Konkoly-Thege ut 29-33 (Hungary)
Publication Date:
OSTI Identifier:
22492965
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Applied Physics; Journal Volume: 118; Journal Issue: 20; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; ANNEALING; ARGON; COBALT COMPOUNDS; COERCIVE FORCE; CONTROLLED ATMOSPHERES; DEPOSITION; GLASS; LATTICE PARAMETERS; MAGNETIC PROPERTIES; NITROGEN; PLATINUM COMPOUNDS; TEXTURE; THIN FILMS; TITANIUM NITRIDES; X-RAY DIFFRACTION