skip to main content

SciTech ConnectSciTech Connect

Title: Phase-selective vanadium dioxide (VO{sub 2}) nanostructured thin films by pulsed laser deposition

Thin films of monoclinic nanostructured vanadium dioxide are notoriously difficult to produce in a selective manner. To date, post-annealing, after pulsed laser deposition (PLD), has been used to revert the crystal phase or to remove impurities, and non-glass substrates have been employed, thus reducing the efficacy of the transparency switching. Here, we overcome these limitations in PLD by optimizing a laser-ablation and deposition process through optical imaging of the laser-induced plasma. We report high quality monoclinic rutile-type vanadium dioxide (VO{sub 2}) (M1) nanoparticles without post-annealing, and on a glass substrate. Our samples demonstrate a reversible metal-to-insulator transition at ∼43 °C, without any doping, paving the way to switchable transparency in optical materials at room temperature.
Authors:
 [1] ;  [2] ; ; ;  [3] ;  [1] ; ;  [4] ;  [5]
  1. CSIR-National Laser Centre, PO BOX 395, Pretoria 0001 (South Africa)
  2. (South Africa)
  3. Division des Milieux Ionisés et Laser, Centre de Développement des Technologies Avancées, Cité du 20 Août 1956, BP 17, Baba Hassen (Algeria)
  4. DST/CSIR National Centre for Nano-Structured Materials, PO BOX 395, Pretoria 0001 (South Africa)
  5. School of Physics, University of the Witwatersrand, Private Bag 3, Wits 2050, Johannesburg (South Africa)
Publication Date:
OSTI Identifier:
22492873
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Applied Physics; Journal Volume: 118; Journal Issue: 16; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; ABLATION; ANNEALING; CRYSTALS; ENERGY BEAM DEPOSITION; IMPURITIES; LASER RADIATION; MONOCLINIC LATTICES; NANOPARTICLES; NANOSTRUCTURES; OPACITY; OPTIMIZATION; PLASMA; PULSED IRRADIATION; RUTILE; SUBSTRATES; TEMPERATURE RANGE 0273-0400 K; THIN FILMS; VANADIUM OXIDES