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Title: A controllable IC-compatible thin-film fuse realized using electro-explosion

A controllable IC-compatible thin-film fuse was developed that had Al/SiO{sub 2} thin-film stacks on a silicon substrate. The micro fuse has both a traditional mode and a controllable mode when applied as a fuse. It blows at 800 mA and 913.8 mV in the traditional mode. In the controllable mode, it blows within 400 ns at 10 V. It can be used for small electronic elements as well as electropyrotechnic initiators to improve the no-firing current.
Authors:
; ;  [1]
  1. School of Mechatronical Engineering, Beijing Institute of Technology, Beijing 100081 (China)
Publication Date:
OSTI Identifier:
22492422
Resource Type:
Journal Article
Resource Relation:
Journal Name: AIP Advances; Journal Volume: 6; Journal Issue: 1; Other Information: (c) 2016 Author(s); Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; ALUMINIUM; ELECTRIC CURRENTS; ELECTRIC FUSES; ELECTRIC POTENTIAL; SILICA; SILICON; SILICON OXIDES; STACKS; SUBSTRATES; THIN FILMS