A controllable IC-compatible thin-film fuse realized using electro-explosion

Ding, Xuran; Lou, Wenzhong; Feng, Yue

doi:10.1063/1.4941074

Title: A controllable IC-compatible thin-film fuse realized using electro-explosion

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Abstract

A controllable IC-compatible thin-film fuse was developed that had Al/SiO{sub 2} thin-film stacks on a silicon substrate. The micro fuse has both a traditional mode and a controllable mode when applied as a fuse. It blows at 800 mA and 913.8 mV in the traditional mode. In the controllable mode, it blows within 400 ns at 10 V. It can be used for small electronic elements as well as electropyrotechnic initiators to improve the no-firing current.

Authors:

Ding, Xuran; Lou, Wenzhong; Feng, Yue ^[1]

School of Mechatronical Engineering, Beijing Institute of Technology, Beijing 100081 (China)

Publication Date:: Fri Jan 15 00:00:00 EST 2016

OSTI Identifier:: 22492422

Resource Type:: Journal Article

Journal Name:: AIP Advances

Additional Journal Information:: Journal Volume: 6; Journal Issue: 1; Other Information: (c) 2016 Author(s); Country of input: International Atomic Energy Agency (IAEA); Journal ID: ISSN 2158-3226

Country of Publication:: United States

Language:: English

Subject:: 36 MATERIALS SCIENCE; ALUMINIUM; ELECTRIC CURRENTS; ELECTRIC FUSES; ELECTRIC POTENTIAL; SILICA; SILICON; SILICON OXIDES; STACKS; SUBSTRATES; THIN FILMS

Citation Formats


                    Ding, Xuran, Lou, Wenzhong, and Feng, Yue. A controllable IC-compatible thin-film fuse realized using electro-explosion.  United States: N. p., 2016. 
        Web.  doi:10.1063/1.4941074.

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                    Ding, Xuran, Lou, Wenzhong, & Feng, Yue. A controllable IC-compatible thin-film fuse realized using electro-explosion.  United States.  https://doi.org/10.1063/1.4941074

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                    Ding, Xuran, Lou, Wenzhong, and Feng, Yue. 2016.  
        "A controllable IC-compatible thin-film fuse realized using electro-explosion".  United States.  https://doi.org/10.1063/1.4941074.

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@article{osti_22492422,

  title        = {A controllable IC-compatible thin-film fuse realized using electro-explosion},

  author       = {Ding, Xuran and Lou, Wenzhong and Feng, Yue},

  abstractNote = {A controllable IC-compatible thin-film fuse was developed that had Al/SiO{sub 2} thin-film stacks on a silicon substrate. The micro fuse has both a traditional mode and a controllable mode when applied as a fuse. It blows at 800 mA and 913.8 mV in the traditional mode. In the controllable mode, it blows within 400 ns at 10 V. It can be used for small electronic elements as well as electropyrotechnic initiators to improve the no-firing current.},

  doi          = {10.1063/1.4941074},

  url          = {https://www.osti.gov/biblio/22492422},
  journal      = {AIP Advances},

  issn         = {2158-3226},

  number       = 1,

  volume       = 6,

  place        = {United States},

  year         = {Fri Jan 15 00:00:00 EST 2016},

  month        = {Fri Jan 15 00:00:00 EST 2016}

}

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