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Title: Phase formation, thermal stability and magnetic moment of cobalt nitride thin films

Cobalt nitride (Co-N) thin films prepared using a reactive magnetron sputtering process are studied in this work. During the thin film deposition process, the relative nitrogen gas flow (R{sub N{sub 2}}) was varied. As R{sub N{sub 2}} increases, Co(N), Co{sub 4}N, Co{sub 3}N and CoN phases are formed. An incremental increase in R{sub N{sub 2}}, after emergence of Co{sub 4}N phase at R{sub N{sub 2}} = 10%, results in a linear increase of the lattice constant (a) of Co{sub 4}N. For R{sub N{sub 2}} = 30%, a maximizes and becomes comparable to its theoretical value. An expansion in a of Co{sub 4}N, results in an enhancement of the magnetic moment, to the extent that it becomes even larger than pure Co. Such larger than pure metal magnetic moment for tetra-metal nitrides (M{sub 4}N) have been theoretically predicted. Incorporation of N atoms in M{sub 4}N configuration results in an expansion of a (relative to pure metal) and enhances the itinerary of conduction band electrons leading to larger than pure metal magnetic moment for M{sub 4}N compounds. Though a higher (than pure Fe) magnetic moment for Fe{sub 4}N thin films has been evidenced experimentally, higher (than pure Co) magnetic moment is evidencedmore » in this work.« less
Authors:
 [1] ; ; ;  [2]
  1. Institute of Engineering and Technology DAVV, Khandwa Road, Indore 452 017 (India)
  2. UGC-DAE Consortium for Scientific Research, University Campus, Khandwa Road, Indore 452 001 (India)
Publication Date:
OSTI Identifier:
22492350
Resource Type:
Journal Article
Resource Relation:
Journal Name: AIP Advances; Journal Volume: 5; Journal Issue: 9; Other Information: (c) 2015 Author(s); Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; COBALT; COBALT COMPOUNDS; COMPARATIVE EVALUATIONS; DEPOSITION; ELECTRONS; EXPANSION; GAS FLOW; IRON NITRIDES; LATTICE PARAMETERS; MAGNETIC MOMENTS; NITROGEN; PHASE STABILITY; SPUTTERING; THIN FILMS