skip to main content

SciTech ConnectSciTech Connect

Title: Highly efficient and controllable method to fabricate ultrafine metallic nanostructures

We report a highly efficient, controllable and scalable method to fabricate various ultrafine metallic nanostructures in this paper. The method starts with the negative poly-methyl-methacrylate (PMMA) resist pattern with line-width superior to 20 nm, which is obtained from overexposing of the conventionally positive PMMA under a low energy electron beam. The pattern is further shrunk to sub-10 nm line-width through reactive ion etching. Using the patter as a mask, we can fabricate various ultrafine metallic nanostructures with the line-width even less than 10 nm. This ion tailored mask lithography (ITML) method enriches the top-down fabrication strategy and provides potential opportunity for studying quantum effects in a variety of materials.
Authors:
; ; ; ;  [1] ;  [2] ;  [3]
  1. Hefei National Laboratory for Physical Sciences at the Microscale, University of Science & Technology of China, Hefei 230026 (China)
  2. Physics school, Anhui University, Hefei Anhui 230601 China (China)
  3. National Synchrotron Radiation Laboratory, University of Science & Technology of China, Hefei 230027 (China)
Publication Date:
OSTI Identifier:
22492198
Resource Type:
Journal Article
Resource Relation:
Journal Name: AIP Advances; Journal Volume: 5; Journal Issue: 11; Other Information: (c) 2015 Author(s); Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; ELECTRON BEAMS; ETCHING; FABRICATION; LINE WIDTHS; MASKING; METALS; METHACRYLIC ACID ESTERS; NANOSTRUCTURES; PMMA; POTENTIALS