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Title: Experimental investigation on plasma parameter profiles on a wafer level with reactor gap lengths in an inductively coupled plasma

The gap length effect on plasma parameters is investigated in a planar type inductively coupled plasma at various conditions. The spatial profiles of ion densities and the electron temperatures on the wafer level are measured with a 2D probe array based on the floating harmonic method. At low pressures, the spatial profiles of the plasma parameters rarely changed by various gap lengths, which indicates that nonlocal kinetics are dominant at low pressures. However, at relatively high pressures, the spatial profiles of the plasma parameter changed dramatically. These plasma distribution profile characteristics should be considered for plasma reactor design and processing setup, and can be explained by the diffusion of charged particles and the local kinetics.
Authors:
;  [1] ;  [2]
  1. Department of Electrical Engineering, Hanyang University, Seoul 133-791 (Korea, Republic of)
  2. Department of Nanoscale Semiconductor Engineering, Hanyang University, Seoul 133-791 (Korea, Republic of)
Publication Date:
OSTI Identifier:
22490988
Resource Type:
Journal Article
Resource Relation:
Journal Name: Physics of Plasmas; Journal Volume: 22; Journal Issue: 7; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
70 PLASMA PHYSICS AND FUSION TECHNOLOGY; CHARGED PARTICLES; DIFFUSION; ELECTRON TEMPERATURE; EXPERIMENT RESULTS; ION DENSITY; KINETICS; PLASMA; PRESSURE RANGE KILO PA; PRESSURE RANGE MEGA PA 10-100; PROBES