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Title: The influence of ions and the induced secondary emission on the nanosecond high-gradient microwave breakdown at metal surface

Journal Article · · Physics of Plasmas
DOI:https://doi.org/10.1063/1.4922759· OSTI ID:22490951
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  1. Science and Technology on High Power Microwave Laboratory, Northwest Institute of Nuclear Technology, Xi'an, Shaanxi 710024 (China)
  2. Key Laboratory of Physical Electronics and Devices of the Ministry of Education, Xi'an Jiaotong University, Xi'an, Shaanxi 710049 (China)

The mechanism of ultrafast breakdown at metal/vacuum interface in the high-power microwave waveguides is studied. In order to realize the nanosecond discharge, the required ambient gas pressure above the metal surface is approximately calculated as high as several Torr due to the low ionization-rate for high-energy electrons and short pulse. The local high pressure may come from the evaporated microscopic protrusions due to Joule heating and gas desorption. Besides, ions accelerated by the ambient space charge field could obtain sufficient high energy to collide and sputter the metal atoms to increase the ambient pressure. The positive feedbacks during the rapid discharge are studied by particle-in-cell simulation. The relatively high-energy ions could generate secondary electrons. It is shown that, as the positive feedback, the secondary electrons induce the gas desorption and stronger ionization, resulting in ion and electron density increasing as well as sheath field further increasing. As a result, more higher-energy ions bombard metal surface, leading to higher secondary electron yield and higher density plasma generated to cut off the microwave transmission finally. These nonlinear courses realize the ultrafast discharge in waveguides.

OSTI ID:
22490951
Journal Information:
Physics of Plasmas, Vol. 22, Issue 6; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 1070-664X
Country of Publication:
United States
Language:
English