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Title: Bulk plasma fragmentation in a C{sub 4}F{sub 8} inductively coupled plasma: A hybrid modeling study

A hybrid model is used to investigate the fragmentation of C{sub 4}F{sub 8} inductive discharges. Indeed, the resulting reactive species are crucial for the optimization of the Si-based etching process, since they determine the mechanisms of fluorination, polymerization, and sputtering. In this paper, we present the dissociation degree, the density ratio of F vs. C{sub x}F{sub y} (i.e., fluorocarbon (fc) neutrals), the neutral vs. positive ion density ratio, details on the neutral and ion components, and fractions of various fc neutrals (or ions) in the total fc neutral (or ion) density in a C{sub 4}F{sub 8} inductively coupled plasma source, as well as the effect of pressure and power on these results. To analyze the fragmentation behavior, the electron density and temperature and electron energy probability function (EEPF) are investigated. Moreover, the main electron-impact generation sources for all considered neutrals and ions are determined from the complicated C{sub 4}F{sub 8} reaction set used in the model. The C{sub 4}F{sub 8} plasma fragmentation is explained, taking into account many factors, such as the EEPF characteristics, the dominance of primary and secondary processes, and the thresholds of dissociation and ionization. The simulation results are compared with experiments from literature, and reasonable agreementmore » is obtained. Some discrepancies are observed, which can probably be attributed to the simplified polymer surface kinetics assumed in the model.« less
Authors:
;  [1] ;  [2] ; ;  [1] ;  [3]
  1. School of Physics and Optoelectronic Engineering, Dalian University of Technology, Dalian 116024 (China)
  2. (Belgium)
  3. Research Group PLASMANT, Department of Chemistry, University of Antwerp, Universiteitsplein 1, B-2610 Antwerp (Belgium)
Publication Date:
OSTI Identifier:
22490721
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Applied Physics; Journal Volume: 117; Journal Issue: 24; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; CATIONS; DISSOCIATION; ELECTRON DENSITY; ELECTRONS; ETCHING; FLUORINATION; FRAGMENTATION; ION DENSITY; PLASMA; POLYMERIZATION; SIMULATION; SPUTTERING; SURFACES