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Title: Influence of annealing on the optical properties of vacuum deposited silver thin films

Thin Silver films of thickness 15nm were prepared by thermal evaporation on well cleaned glass substrates at room temperature at a pressure of 2×10{sup −5} mbar with the deposition rate of 0.01À/sec and annealed in air for an hour at temperatures between 300°c and 400°c. The prepared films were characterized by X-ray diffraction (XRD), UV-visible spectroscopy and AFM. The mean grain size of the film at different annealing temperatures was determined by the X-ray diffraction pattern by using Scheer’s formula. It is found that from absorbance studies surface Plasmon peak position decreases as the annealing temperature increases and blue shifted. And also from transmittance studies the thermal effect of silver film strongly affects the optical transmittance. From AFM studies the average particle size and RMS surface roughness increase with increase of annealing temperatures.
Authors:
;  [1] ;  [2] ;  [3]
  1. Department of Physics, NMSSVN College, Madurai-625019 (India)
  2. School of Basic Engineering and Sciences, PSN Engineering College, Melathidior, Thirunelvelli-627152 (India)
  3. School of Physics, Madurai Kamaraj University, Madurai-625021 (India)
Publication Date:
OSTI Identifier:
22490430
Resource Type:
Journal Article
Resource Relation:
Journal Name: AIP Conference Proceedings; Journal Volume: 1665; Journal Issue: 1; Conference: 59. DAE solid state physics symposium 2014, Tamilnadu (India), 16-20 Dec 2014; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; ABSORPTION SPECTROSCOPY; ANNEALING; ATOMIC FORCE MICROSCOPY; EVAPORATION; GLASS; GRAIN SIZE; OPTICAL PROPERTIES; PARTICLE SIZE; PLASMONS; ROUGHNESS; SILVER; SUBSTRATES; SURFACES; TEMPERATURE RANGE 0273-0400 K; THIN FILMS; X-RAY DIFFRACTION