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Title: Removal of carbon contaminations by RF plasma generated reactive species and subsequent effects on optical surface

Carbon contamination on optical elements is a serious issue in synchrotron beam lines for several decades. The basic mechanism of carbon deposition on optics and cleaning strategies are not fully understood. Carbon growth mechanism and optimized cleaning procedures are worldwide under development stage. Optimized RF plasma cleaning is considered an active remedy for the same. In present study carbon contaminated optical test surfaces (carbon capped tungsten thin film) are exposed for 30 minutes to four different gases, rf plasma at constant power and constant dynamic pressure. Structural characterization (thickness, roughness and density) of virgin samples and plasma exposed samples was done by soft x-ray (λ=80 Å) reflectivity measurements at Indus-1 reflectivity beam line. Different gas plasma removes carbon with different rate (0.4 to 0.65 nm /min). A thin layer 2 to 9 nm of different roughness and density is observed at the top surface of tungsten film. Ar gas plasma is found more suitable for cleaning of tungsten surface.
Authors:
; ; ; ;  [1] ; ; ;  [2]
  1. Indus Synchrotron Utilization Division, Raja Ramanna Centre for Advanced Technology, Indore-452013 (India)
  2. Laser Plasma Laboratory, Laser Plasma Division, Raja Ramanna Centre for Advanced Technology, Indore-452013 (India)
Publication Date:
OSTI Identifier:
22490424
Resource Type:
Journal Article
Resource Relation:
Journal Name: AIP Conference Proceedings; Journal Volume: 1665; Journal Issue: 1; Conference: 59. DAE solid state physics symposium 2014, Tamilnadu (India), 16-20 Dec 2014; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; CARBON; DEPOSITION; INDUS-1; OPTICS; PLASMA; REFLECTIVITY; ROUGHNESS; SOFT X RADIATION; SURFACES; SYNCHROTRON RADIATION; THIN FILMS; TUNGSTEN