Magnetic and structural properties of Ni film deposited on Si substrate
- Department of Physics, Manipal University Jaipur, Jaipur-303007 (India)
- Dept. of Physics, ISLE, IPS Academy, Indore-452012 (India)
The structural and magnetic properties of as deposited and annealed Au capped Ni (20 nm) thin films on Si substrate are reported here. In the as prepared condition, the material does not show intermixing but annealing induces clusterization of mobile Ni atoms resulting in an increase in average crystallite size from ∼12 nm to ∼25 nm as revealed from X-ray diffraction measurements. Also, there is significant intermixing at the Ni/Si interface, which leads to the increase in coercivity and M{sub r}/M{sub s} ratio from 14 Oe to 93 Oe and 0.073 to 0.49 respectively. These polycrystalline samples were also subjected to low temperature (5 K) magnetic measurements in order to look for their compatibility for making magnetic recording structures. At low temperature, the as prepared sample shows coercivity of ∼283 Oe which increases to ∼300 Oe in annealed sample. The results are explained in terms of annealing induced intermixing, increase in grain size and release of stresses at Ni/Si interface.
- OSTI ID:
- 22490416
- Journal Information:
- AIP Conference Proceedings, Vol. 1665, Issue 1; Conference: 59. DAE solid state physics symposium 2014, Tamilnadu (India), 16-20 Dec 2014; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0094-243X
- Country of Publication:
- United States
- Language:
- English
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