Development and characterisation of Ni-Si{sub 3}N{sub 4} nanocomposites
Journal Article
·
· AIP Conference Proceedings
- Dept. of Chemistry, PESITM, Shimoga – 577204 (India)
- Dept. of Studies in Chemistry, School of Chemical Sciences, Kuvempu University, Shankaraghatta - 577451, Karnataka (India)
- Dept of Physics, Srinivas School of Engineering, Mukka, Mangalore-574 146, Karnataka (India)
Nickel–Si{sub 3}N{sub 4} composites were generated by means of pulse-reverse (PR) electrodeposition technique. The corrosion rate was calculated for the composites by electrochemical methods such as polarisation and impedance methods. Composites were characterised by scanning electron microscope (SEM) and X-ray diffractometer (XRD) to evaluate their microstructures. Coatings obtained by PR method shows more corrosion resistance than DC generated coatings.
- OSTI ID:
- 22490406
- Journal Information:
- AIP Conference Proceedings, Vol. 1665, Issue 1; Conference: 59. DAE solid state physics symposium 2014, Tamilnadu (India), 16-20 Dec 2014; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0094-243X
- Country of Publication:
- United States
- Language:
- English
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