skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Study of NbC thin films for soft X-ray multilayer applications

Journal Article · · AIP Conference Proceedings
DOI:https://doi.org/10.1063/1.4917912· OSTI ID:22490390
; ;  [1]; ;  [2]
  1. Indus Synchrotrons Utilization Division, Raja Ramanna Centre for Advanced Technology, Indore-452013 (India)
  2. Atomic & Molecular Physics Division, Bhabha Atomic Research Centre, Trombay, Mumbai-400085 (India)

Compound materials are being used in soft x-ray and Extreme ultraviolet (EUV) optics applications. Structural properties of compound materials changes drastically when ultrathin films are formed from bulk material. Structural properties need to be investigated to determine the suitability of compound materials in soft x-ray multilayer applications. In the present study Niobium carbide (NbC) thin films were deposited using ion beam sputtering of an NbC target on Si (100) substrate. Thickness roughness and film mass density was determined from the X-ray reflectivity (XRR) data. XRR data revealed that the film mass density was increasing with increase in film thickness. For 500Ǻ thick film, mass density of 6.85 g/cm{sup 3}, close to bulk density was found. Rms roughness for all the films was less than 10Å. Local structure of NbC thin films was determined from EXAFS measurements. The EXAFS data showed an increase in Nb-C and Nb-(C)-Nb peak ratio approaches towards bulk NbC with increasing thickness of NbC. From the present study, NbC thin films were found suitable for actual use in soft x-ray multilayer applications.

OSTI ID:
22490390
Journal Information:
AIP Conference Proceedings, Vol. 1665, Issue 1; Conference: 59. DAE solid state physics symposium 2014, Tamilnadu (India), 16-20 Dec 2014; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0094-243X
Country of Publication:
United States
Language:
English