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Title: Investigation of optical and interfacial properties of Ag/Ta{sub 2}O{sub 5} metal dielectric multilayer structure

One-dimensional periodic metal-dielectric multilayer thin film structures consisting of Ag and Ta{sub 2}O{sub 5} alternating layers are deposited on glass substrate using RF magnetron sputtering technique. The spectral property of the multilayers has been investigated using spectrophotometry technique. The optical parameters such as refractive index, extinction coefficient, band gap etc., along with film thickness as well as the interfacial layer properties which influence these properties have been probed with spectroscopic ellipsometry technique. Atomic force microscopy has been employed to characterize morphological properties of this metal-dielectric multilayer.
Authors:
; ; ; ;  [1] ; ; ;  [2]
  1. Atomic & Molecular Physics Division, Bhabha Atomic Research Centre, Mumbai-400085 (India)
  2. Optics and Thin Film Laboratory, BARC-Vizag, Autonagar, Visakhapatnam-530012 (India)
Publication Date:
OSTI Identifier:
22490361
Resource Type:
Journal Article
Resource Relation:
Journal Name: AIP Conference Proceedings; Journal Volume: 1665; Journal Issue: 1; Conference: 59. DAE solid state physics symposium 2014, Tamilnadu (India), 16-20 Dec 2014; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; ATOMIC FORCE MICROSCOPY; DIELECTRIC MATERIALS; ELLIPSOMETRY; ENERGY GAP; GLASS; LAYERS; PERIODICITY; PROBES; REFRACTIVE INDEX; SILVER; SPECTROPHOTOMETRY; SPUTTERING; SUBSTRATES; TANTALUM OXIDES; THIN FILMS