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Title: Role of low-energy ion irradiation in the formation of an aluminum germanate layer on a germanium substrate by radical-enhanced atomic layer deposition

Radical-enhanced atomic layer deposition uses oxygen radicals generated by a remote microwave-induced plasma as an oxidant to change the surface reactions of the alternately supplied trimethylaluminum precursor and oxygen radicals on a Ge substrate, which leads to the spontaneous formation of an aluminum germanate layer. In this paper, the effects that low-energy ions, supplied from a remote microwave plasma to the substrate along with the oxygen radicals, have on the surface reactions were studied. From a comparative study of aluminum oxide deposition under controlled ion flux irradiation on the deposition surface, it was found that the ions enhance the formation of the aluminum germanate layer. The plasma potential measured at the substrate position by the Langmuir probe method was 5.4 V. Assuming that the kinetic energy of ions arriving at the substrate surface is comparable to that gained by this plasma potential, such ions have sufficient energy to induce exchange reactions of surface-adsorbed Al atoms with the underlying Ge atoms without causing significant damage to the substrate. This ion-induced exchange reaction between Al and Ge atoms is inferred to be the background kinetics of the aluminum germanate formation by radical-enhanced atomic layer deposition.
Authors:
; ; ;  [1] ; ; ;  [2] ;  [3] ;  [4] ;  [5]
  1. Tokyo University of Science, Suwa, 5000-1 Toyohira, Chino, Nagano 391-0292 (Japan)
  2. University of Yamanashi, 4-3-11 Takeda, Kofu, Yamanashi 400-8511 (Japan)
  3. University of Yamanashi, 7-32 Miyamae, Kofu, Yamanashi 400-8511 (Japan)
  4. SST Inc., 989-6 Shimadadai, Yachiyo, Chiba 276-0004 (Japan)
  5. Hirosaki University, 3 Bunkyo, Hirosaki 036-8561 (Japan)
Publication Date:
OSTI Identifier:
22489814
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films; Journal Volume: 34; Journal Issue: 2; Other Information: (c) 2015 American Vacuum Society; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; ALUMINIUM; ALUMINIUM COMPOUNDS; DAMAGE; DEPOSITION; GERMANATES; IRRADIATION; LANGMUIR PROBE; LAYERS; MICROWAVE RADIATION; OXYGEN; PLASMA; PLASMA POTENTIAL; RADICALS; SUBSTRATES; SURFACES