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Title: Growth of single and bilayer graphene by filtered cathodic vacuum arc technique

The authors present a viable process to grow the high quality graphene films with control over number of layers by the filtered cathodic vacuum arc (FCVA) technique. In the FCVA process, the different carbon concentrations can be controlled by precisely tuning the arc time (1–4 s). The arc generated carbon was deposited on the nickel catalyst at 800 °C, annealed for 10 min, and cooled down to room temperature in the presence of hydrogen gas, resulting in the graphene films with control over number of layers. Prior to arcing, hydrogen etching of nickel was carried out to clean the surface of the substrate. A growth model to prepare the high quality graphene has also been proposed. The as-grown graphene films were transferred to different substrates and are characterized by Raman spectroscopy, optical microscopy, high resolution transmission electron microscopy, and atomic force microscopy to determine the number of layers present in these films. Raman spectra of the prepared graphene films exhibit change in the G peak position from 1582.4 to 1578.1 cm{sup −1}, two-dimensional (2D) peak shifts from 2688.5 to 2703.8 cm{sup −1}, the value of I{sub 2D}/I{sub G} increased from 0.38 to 3.82, and the full width at half maxima of 2D peak changed frommore » 41 to 70 cm{sup −1}, for different layers of graphene films. The high resolution transmission electron microscopy image revealed that the graphene films prepared for 1 and 2 s arc times have single and bi- or trilayered structures, respectively.« less
Authors:
; ;  [1] ;  [2] ;  [3] ;  [4] ;  [5]
  1. Polymorphic Carbon Thin Films Group, Physics of Energy Harvesting Division, CSIR-National Physical Laboratory, Dr. K. S. Krishnan Road, New Delhi 110012, India and Academy of Scientific and Innovative Research (AcSIR), CSIR Campus, New Delhi 110012 (India)
  2. Physics and Engineering of Carbon Materials, Division of Materials Physics and Engineering, CSIR-National Physical Laboratory, Dr. K. S. Krishnan Road, New Delhi 110012, India and Academy of Scientific and Innovative Research (AcSIR), CSIR Campus, New Delhi 110012 (India)
  3. Quantum Phenomena and Applications Group, CSIR-National Physical Laboratory, Dr. K. S. Krishnan Road, New Delhi 110012, India and Academy of Scientific and Innovative Research (AcSIR), CSIR Campus, New Delhi 110012 (India)
  4. Electron and Ion Microscopy, Sophisticated and Analytical Instruments, CSIR-National Physical Laboratory, Dr. K. S. Krishnan Road, New Delhi 110012, India and Academy of Scientific and Innovative Research (AcSIR), CSIR Campus, New Delhi 110012 (India)
  5. Polymorphic Carbon Thin Films Group, Physics of Energy Harvesting Division, CSIR-National Physical Laboratory, Dr. K. S. Krishnan Road, New Delhi 110012 (India)
Publication Date:
OSTI Identifier:
22489799
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films; Journal Volume: 34; Journal Issue: 2; Other Information: (c) 2015 American Vacuum Society; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; ATOMIC FORCE MICROSCOPY; ETCHING; FILMS; GRAPHENE; HYDROGEN; IODINE; LAYERS; NICKEL; OPTICAL MICROSCOPY; RAMAN SPECTRA; RAMAN SPECTROSCOPY; SUBSTRATES; TEMPERATURE RANGE 0273-0400 K; TRANSMISSION ELECTRON MICROSCOPY