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Title: Enhancing of catalytic properties of vanadia via surface doping with phosphorus using atomic layer deposition

Atomic layer deposition is mainly used to deposit thin films on flat substrates. Here, the authors deposit a submonolayer of phosphorus on V{sub 2}O{sub 5} in the form of catalyst powder. The goal is to prepare a model catalyst related to the vanadyl pyrophosphate catalyst (VO){sub 2}P{sub 2}O{sub 7} industrially used for the oxidation of n-butane to maleic anhydride. The oxidation state of vanadium in vanadyl pyrophosphate is 4+. In literature, it was shown that the surface of vanadyl pyrophosphate contains V{sup 5+} and is enriched in phosphorus under reaction conditions. On account of this, V{sub 2}O{sub 5} with the oxidation state of 5+ for vanadium partially covered with phosphorus can be regarded as a suitable model catalyst. The catalytic performance of the model catalyst prepared via atomic layer deposition was measured and compared to the performance of catalysts prepared via incipient wetness impregnation and the original V{sub 2}O{sub 5} substrate. It could be clearly shown that the dedicated deposition of phosphorus by atomic layer deposition enhances the catalytic performance of V{sub 2}O{sub 5} by suppression of total oxidation reactions, thereby increasing the selectivity to maleic anhydride.
Authors:
;  [1] ;  [2] ; ; ;  [3] ;  [4] ;  [5]
  1. BasCat - UniCat BASF JointLab, Technische Universität Berlin, Sekr. EW K 01, Hardenbergstraße 36, 10623 Berlin (Germany)
  2. Process Research and Chemical Engineering, BASF SE, Carl-Bosch-Straße 38, 67056 Ludwigshafen (Germany)
  3. Department of Inorganic Chemistry, Fritz-Haber-Institut der Max-Planck-Gesellschaft, Faradayweg 4-6, 14195 Berlin (Germany)
  4. BasCat - UniCat BASF JointLab, Technische Universität Berlin, Sekr. EW K 01, Hardenbergstraße 36, 10623 Berlin, Germany and Technische Universität Berlin, Institut für Chemie, Sekr. C2, Straße des 17. Juni 135, 10623 Berlin (Germany)
  5. BasCat - UniCat BASF JointLab, Technische Universität Berlin, Sekr. EW K 01, Hardenbergstraße 36, 10623 Berlin, Germany and Process Research and Chemical Engineering, BASF SE, Carl-Bosch-Straße 38, 67056 Ludwigshafen (Germany)
Publication Date:
OSTI Identifier:
22489767
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films; Journal Volume: 34; Journal Issue: 1; Other Information: (c) 2015 American Vacuum Society; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
37 INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY; BUTANE; CATALYSTS; OXIDATION; PHOSPHORUS; SURFACES; THIN FILMS; VANADATES; VANADIUM; VANADIUM IONS; VANADIUM OXIDES